Xiamen Yirui Technology Co., Ltd
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Microwave plasma assisted atomic layer deposition system 12 inch wafer compatible with ultra-high plasma density

$negotiable / platform
Reference Price
1platform (Min. Order)
Ship From
Shenzhen, Guangdong
Shipping
To be negotiated with the supplier
Customization
For customization requests, please
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Key Attributes
Details
Price Disclaimer
Brand
Xiamen Yirui Technology Co., Ltd
Usage environment
Indoor
Does it support high-efficiency filters
No
noise
Based on actual equipment
Does it support customized processing
Yes
Power
≥3K
Do you need power on
Yes
Operating temperature
<100
The principle is based on
According to the product title and description
Control method
Continuously adjustable
Net weight of equipment
Based on actual equipment
Structural form
integration
Suitable occasions
Targeting advanced processes below 7nm
Working principle
Microwave plasma assisted
Operation mode
continuous operation
processing technology
Atomic Layer Deposition
Usage
SiO2, SixNx, etc
Model number
Atomic layer deposition system
principle
Atomic Layer Deposition
Application devices
Frontier Process Research
Equipment deadweight
Subject to actual
Length
Based on actual equipment
Is it imported
No
Device Name
Microwave plasma assisted atomic layer deposition system
Can a filter be installed
No
Scope of application
Advanced technology below 7nm
Details





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