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Shamke Corporation's independently controllable flexible substrate coating for research semiconductor CVD equipment
$14.29 / platform
Reference Price1platform (Min. Order)
Ship From
Shanghai, Shanghai
Shipping
To be negotiated with the supplier
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Key Attributes
Details
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degree of vacuum
About 10 ^ -4Pa
Processing chamber size
About 500 * 300mm
Applicable substrate
Silicon wafer
heating rate
About 10 ℃ per minute
User Interface
Touchscreen display
Rated power
About 15kW
Exhaust method
Graded extraction
Installation method
floor installation
Heating method
High-frequency heating
Monitoring function
Real time working condition data
Cavity material
304 stainless steel
System compatibility
Compatible with universal processes
Details
Price Disclaimer
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